Bright Peaks for Smaller Chips

Salden writes "University of Wisconsin scientists propose a way to create 20nm chip features. They were investigating the limits of X-ray lithography and discovered that they could control the phase of X-rays by adjusting the gap between a mask and wafer. Pretty cool."

Comments

Its not just the drawn length that matters

[twfry]

Already with 90nm processes, the height of the trans' gate is ~1.2nm. That's about 5-10 silicon atoms. The net result is you have to continuously lower the operating voltage to reduce current leakage. 90nm processes operate at ~1.0-1.5V.

A drawn 20nm process will have an even shorter gate height. What would we be down to then? ~1-4 silicon atoms? This would force the operating voltatge to be lowered even more, possibly approaching Vt. (I forget exactly but around ~0.7V)

I'm not saying that we'll never have a 20nm process, we will. But there is going to be quite a bit more involved than figuring out how to mask the waffer. i.e. double gates, etc.