IBM Demonstrates High-k/Metal Gate Chips
Last summer we discussed twin announcements from Intel and IBM/AMD about a new chip manufacturing technology dubbed high-k/metal gate. Intel is using the tech to improve speed and power consumption in its 45-nm chips. IBM, along with its manufacturing partners, just demonstrated chips it says show that high-k/metal gate technology at 32 nm can result in performance gains up to 30% and power savings up to 50%, compared to 45-nm process. IBM plans to be manufacturing 32 nm parts by the end of 2009. (AMD is not using high-k/metal gate yet, but it has access to the technology by virtue of its agreements with IBM.)
and it just goes to show that silicon is not dead yet
AMD earned my loyalty many times over the years, and now that it's fallen from the top of the price/performance heap, I feel bad buying another chip. This is the company who made the chip for my first computer, that made 64 bit mainstream, and made intel actually improve their products. They've done so much for the industry, it'd be a shame for them to continue taking a pounding like they have.
Also, I own some of their stock. Go team!
Graphene is not at all nearly ready to even build reliable, well-performing transistors with it. I'm in a research group that is trying to implant a gate electrode into Silicon-carbide with a Graphene layer ontop, but that's still basic research. If it should really work with good yield and that also in an industrial process, then we can talk about Graphene-based CPUs.
And by the way: it's spelled "Arsenide"