IBM Demonstrates High-k/Metal Gate Chips
Last summer we discussed twin announcements from Intel and IBM/AMD about a new chip manufacturing technology dubbed high-k/metal gate. Intel is using the tech to improve speed and power consumption in its 45-nm chips. IBM, along with its manufacturing partners, just demonstrated chips it says show that high-k/metal gate technology at 32 nm can result in performance gains up to 30% and power savings up to 50%, compared to 45-nm process. IBM plans to be manufacturing 32 nm parts by the end of 2009. (AMD is not using high-k/metal gate yet, but it has access to the technology by virtue of its agreements with IBM.)
The moral behaviour of the company making the product is to be taken into account, at least it is in my case.
If company A has tried to screw me over several times (defective products), kept lying about it, and engages in generally anti-competitive behaviour, then I will buy products from company B instead.
Even if B's product are less competitive by a certain margin left to my appreciation.
Some will say that I am acting against how the market is supposed to work, that is not true.
Business honesty and customer consideration IS valuable to my eyes, and I factor it in the final price of the product.
Hence, I will pay more to buy B's product.
Graphene is not at all nearly ready to even build reliable, well-performing transistors with it. I'm in a research group that is trying to implant a gate electrode into Silicon-carbide with a Graphene layer ontop, but that's still basic research. If it should really work with good yield and that also in an industrial process, then we can talk about Graphene-based CPUs.
And by the way: it's spelled "Arsenide"