Bright Peaks for Smaller Chips
Salden writes "University of Wisconsin scientists propose a way to create 20nm chip features. They were investigating the limits of X-ray lithography and discovered that they could control the phase of X-rays by adjusting the gap between a mask and wafer. Pretty cool."
It seems that new designs are overdue.
That might come from Elbrus
Seems like an interesting article, especially the part about IA-64 and Transmeta.
FRA: STFU GTFO