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New Photolithography Process

Posted by Hemos on from the smaller-and-smaller-we-go dept.

dragons_flight writes "Motorola has announced a new photolithography process capable of making chip features smaller than 100 nm, with the aim of eventually going as low as 13 nm. For reference, the current next-generation standard is 157 nm."

1 of 81 comments (clear)

  1. Word usage note by CrosseyedPainless · · Score: 3, Funny

    Does anyone else find the phrase "current next-generation standard" strange? My parser's still balking at it.