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New Photolithography Process

Posted by Hemos on from the smaller-and-smaller-we-go dept.

dragons_flight writes "Motorola has announced a new photolithography process capable of making chip features smaller than 100 nm, with the aim of eventually going as low as 13 nm. For reference, the current next-generation standard is 157 nm."

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  1. Scattered Angular Limiting Projection Electron by javamark · · Score: 2, Interesting

    4 years ago I saw a v-expensive setup at LUCENT called SCALPEL, which stood for Scattered Angular Limiting Projection Electron Lithography, which uses high and low Z (atomic number) materials to pattern flood illuminate electron-photo-resists down to sub 30nm. The question now is how do you dope at such scales ? a.k.a Quantum doping