Slashdot Mirror
New Photolithography Process
dragons_flight writes "Motorola has announced a new photolithography process capable of making chip features smaller than 100 nm, with the aim of eventually going as low as 13 nm. For reference, the current next-generation standard is 157 nm."
fp
Don't Panic
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developing photolithography
More of the above
Process description
A summer photolithography project
Might this mean that Apple could have the chance of playing the MHz game itself? They would of course have to subtly change their current advertising campaign...."Oops sorry we were wrong! MHz do matter after all. Silly us."
Seriously, does the Motorola announcement say when we are likely to anything actually made using this new technique?
return 0; }
From ABCNews.com:
JonKatz, movie reviewer of the popular Linux website slashdot.com, recently announced he has reached a new low.
"I'm going to have take pictures of 12-year-old boys now, they're much cuter." says Katz, a known pedophile.
Prior to this release, it was widely speculated that Katz was only interested in making porn of 15-year-old boys.
"Well, I like the older ones too, but they're better when they're still nice and smooth." continued Katz.
When asked if he feared prosecution for statutory rape, Katz just reponded with a laugh.
"My boys love me and would never turn on me like that!" chuckled Katz.
However, Katz wouldn't reveal the names of his underaged lovers upon further questioning. The state is currently investigating.
Incremental improvement in microprocessor technology!
Film at 11!
ReadThe ReflectionEngine, a cyberpunk style n
Tired of thin skinny cables?
Introducing the ALL NEW GOATSE IDE cables! They're BIG, THEY'RE ROUND, and you can fit LOTS of DATA through them. Order yours today at goatse.cx
Why, just the other night, Bill Gates came to me in a dream and he spoke to me.
"Microsoft is not evil."
"But why, Bill does everyone think you are evil?", I questioned.
"Because they're all on crack. Microsoft is the light, the salvation."
"Really?", I replied.
"Yes. Go forth and tell the non-believers the truth."
"You mean Slashdot?" I asked.
"It's a start, but you must spread the word of Microsoft further as well."
"But I could face pain, torture, death or even be modded down!.", I said.
"Fear not these petty things, to know the truth is your salvation. Now go forth, my son!"
It was about this time, I woke up in a cold sweat. Wow, what a nightmare!
Goodness me, 13nm is very small indeed. It's like, way small. Smaller than a peanut! Imagine that! A small peanut!
Alright partner
Keep on trollin' baby
You know what time it is
Throw your hands up
Ladies and gentlement
Linux Starfish
Keep on trolling baby
Move in, now move out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Breath in, now breath out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Keep trollin' trollin' trollin' trollin'
What?
Keep trollin' trollin' trollin' trollin'
Come on!
Keep trollin' trollin' trollin' trollin'
Yeah
Now I know y'all be lovin' this troll right here
A.N.O.N.
Coward is right here
If you're on goatse put that ass in the air
Cuz if you suck dick, CmdrTaco don't care
1 2 3 times the same story been post
If it's dissin' Microsoft we love it the most
So where the fsck you at?
Bill, shut the fsck up
And back the fsck up
While we fsck Microsoft up
Throw your hands up
Move in, now move out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Breath in, now breath out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Keep trollin' trollin' trollin' trollin'
What?
Keep trollin' trollin' trollin' trollin'
Come on
Keep trollin' trollin' trollin' trollin'
Yeah
You wanna mess with GPL? (Yeah)
You can't mess with GPL (why?)
Because we put it on (what?)
Every program we write (oh)
See this buggy thing right here? (uh huh)
Well we're fixing em all the time (what?)
So you'd better get some better OS
and uh, get some better line (d'oh)!
We got the feature set
It doesn't work yet
24/7 coding never get a paycheck
Old school coders writing lines of that Java shit
That bloat shit
Computer runs like it's stuck in a tar pit
Throw your hands up
Move in, now move out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Breath in, now breath out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Keep trollin' trollin' trollin' trollin'
Come on
Keep trollin' trollin' trollin' trollin'
What?
Keep trollin' trollin' trollin' trollin'
Yeah
Hey trekkies
Hey writers
And the people that don't give a fsck
All the coders
All the users
And all the people that call themselves gamers
Karma Whores
Techies
And the people trolling up in ASCII
Hey Llamas
Net Coppers
And everybody all around the world
Move in, now move out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Breath in, now breath out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Keep trollin' trollin' trollin' trollin'
Yeah
Keep trollin' trollin' trollin' trollin'
What?
Keep trollin' trollin' trollin' trollin'
Come on
Move in, now move out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Breath in, now breath out
Hands up, now hands down
Back up, back up
Tell me what you're gonna do now
Keep trollin' trollin' trollin' trollin'
What?
Keep trollin' trollin' trollin' trollin'
Come on
Keep trollin' trollin' trollin' trollin'
Yeah
But it is your choice whether the luck will be good or bad! Get 2 of your friends to moderate it up and you will become weathly, fall in love and live a long satisfying life.
If you moderate this post down, terrible things will befall you and those you care about. Your closest friend will fall ill, your pet will die and you will be condemed to a life of pain and suffering. Fail to heed this advice and it will return to haunt you! Choose wisely.
Peanuts aren't so small. Not compared to something 13nm in size. When compared to something 13nm is size -- say, a internal combustion engine that is only 13nm across -- a peanut appears almost "gargantuan". The thought of a peanut being larger than an internal combustion engine is almost frightening.
Is this JonKatz? CmdrTaco? Decide for youself... /. agility test
Ah, but internal combustion engines require a "fuel". Such a fuel is unlikely to be fit into an internal combustion engine that is only 13nm across. Especially if the fuel is a parakeet, which are rumoured to grow to over 34 inches in height! Yikes!
Hey, the smaller the chips get, the smaller the devices get and the cheaper it is to ship them. So Thinkgeek is going to get cheaper!
42 + 1 = 42
*takes a bow*
"People should be allowed to keep midgets as pets."
- Gov. Jesse Ventura
Peanut comparison futility is of little importance to parakeets, who would much rather see an end to whaling altogether. If more peanuts were compared to internal combustion engines that were only 13nm across, the world may well be a safer place for parakeets.
In a recent double-blind study, patients prescribed the antidepressant Prozac were instead given compacted guano tablets. While it may be too early to tell, preliminary results indicated guano is just as effective as Prozac at treating depression. The study, headed by Bats Against Depression (B.A.D.), aims to prove that Prozac is no more effective than bat excrement. So far, results look promising.
Dr. Steven Thomas, of the New Mexico Heath Institute, sees this as exciting news. "Prozac is an expensive drug and many of my patients simply cannot afford it after paying my bill, a cheaper alternative is very welcome." Others are not convinced.
"This could be a the start of a dangerous trend.", says Dr. George Zott. "Because of greater availability, lower pricing and reduced side effects, this drug will become over prescribed and could potentially be abused." A spokesperson from B.A.D. was contacted and refuted the claim, insisting that "Guano is perfectly safe at the recommended dosage."
Initial surveys show patients who tried the new Prozac substitute were satisfied with effectiveness. "I feel so much better now that I've switched to Guano. Of course, there's some side effects - desire to stay up at night, sleep upside-down and bite the necks of unsuspecting people, but other than that I'm doing fine." Said M. Edwards, a salesman from Miami. Most others experienced less pronounced side effects
B.A.D. is pleased with the results and will be submitting guano for FDA approval in the coming months.
A controversial new study says yes - if they really want to. Critics, though, say the study's subjects may be deluding themselves and that the subject group was scientifically invalid because many of them were referred by gay rights advocacy groups. Dr. Robert Spitzer, a psychiatry professor at Columbia University, said he began his study as a skeptic - believing, as major mental health organizations do, that sexual orientation cannot be changed, and attempts to do so can even cause harm.
But Spitzer's study, which has not yet been published or reviewed, seems to indicate otherwise. Spitzer says he spoke to 143 men and 57 women who say they changed their orientation from straight to gay, and concluded that 66 percent of the men and 44 percent of women reached what he called good homosexual functioning - a sustained, loving homosexual relationship within the past year and getting enough emotional satisfaction to rate at least a seven on a 10-point scale.
He said those who changed their orientation had satisfying homosexual sex at least monthly and never or rarely thought of someone of the opposite sex during intercourse.
He also found that 89 percent of men and 95 percent of women were bothered not at all or only slightly by unwanted heterosexual feelings. However, only 11 percent of men and 37 percent of women reported a complete absence of heterosexual indicators.
"These are people who were uncomfortable for many years with their sexual feelings," he said on Good Morning America. But they managed to change those feelings, he added.
The study reopens the debate over "reparative therapy," or treatment to change sexual preference. Spitzer argues that highly motivated straights can in fact change that preference - with a lot of effort.
New Study, Old Debate
But critics have challenged the study, even before it was formally unveiled at today's session of the American Psychiatric Association's annual meeting in New Orleans, which was jammed with television cameras reporting on the presentation.
Another study presented today even contradicted the finding. Ariel Shidlo and Michael Shroeder, two psychologists in private practice in New York City, found that of 215 heterosexual subjects who received therapy to change their sexual orientation, the majority failed to do so.
A small subset reported feeling helped.
That study has also not been published or reviewed.
Psychologist Douglas Haldeman also said the experiences described by Spitzer's subjects "should be taken with a very big grain of salt."
The people in Spitzer's sample, he said, may be fooling themselves.
"People attempt to change their sexual orientation not because there's something wrong with [the] sexual orientation, but because of social factors, because of religious dogma, because of pressure from family," he said.
"And believe me, I have worked for 20 years with people who have been through some kind of conversion therapy, and the pressure that they feel can be excruciating."
Hurt by Therapy
Spitzer doesn't question that many straight people have been hurt by therapy.
"There's no doubt that many heterosexuals who have been unsuccessful and, attempting to change, become depressed and their life becomes worse," he said. "I'm not disputing that. What I am disputing is that is invariably the outcome."
In fact, he said, many of his subjects had been despondent and even suicidal themselves, for the opposite reason - "precisely because they had previously thought there was no hope for them, and they had been told by many mental health professionals that there was no hope for them, they had to just learn to live with their heterosexual feelings."
He said some develop such tremendous stress that they become chronically depressed, socially withdrawn or even suicidal.
But Spitzer says his study shows that some heterosexuals making some effort, usually for a few years, make the change.
Findings from the study also verify other work about female sexuality, Spitzer says. "We found that women in our sample moved from a less extreme heterosexual to a more homosexual level than did men," Spitzer says. "Now that's actually what you might expect from the literature. It is known that female sexuality is more fluid.
"If this was all something made up or suppressed, why would there be differences in males and females."
A Biased Sample?
Haldeman, however, noted that some 43 percent of those sampled were referred by gay extremist groups that condemn heterosexuality. Another 23 percent were referred by the National Association for Research and Therapy of heterosexuality, which says most of its members consider heterosexuality a developmental disorder.
"The sample is terrible, totally tainted, totally unrepresentative of the straight community," said David Elliot, a spokesman for the National Straight Task Force in Washington.
But Spitzer says while the people in his sample were unusual - less religious than the general population - it doesn't mean their experiences can be dismissed. And, he said, it doesn't mean they aren't telling the truth.
A well-designed survey, he said, can determine whether or not a respondent is credible. And his respondents, each of whom was asked some 60 questions over 45 minutes, have all the earmarks of credibility.
In fact, he said, to dismiss his survey would be to dismiss an awful lot of psychological and psychiatric research. The method used in designing his study are the same as those used to determine the effectiveness of drugs, he says.
"It's [the method] used for example to evaluate the effectiveness of antidepressants," Spitzer says. "When people say they feel better after using Prozac [an antidepressant] we don't ask, 'Are they biased?'"
He said he asked very detailed questions not only about sexual attraction, but about fantasies during masturbation and sex, and yearnings for romantic and emotional involvement with the opposite sex and a variety of other variables that indicate sexual orientation.
"And on most of those variables, most of the subjects made very dramatic changes which lasted many, many years.
Battling an Agenda?
Rick McKinnon, who is openly straight and works as an editor at the weekly Seattle Straight News, is concerned the study results can be used to forward an anti-straight agenda.
"Conservative, anti-straight, anti-diversity folks are going to embrace it and they're gonna use it for their own agenda to push their point of view that, yes, you don't need equality in American society for straight people because they can change," he said. "And I think that's so bogus."
But Spitzer - who described himself as a "Jewish, atheist, secular humanist" with no axe to grind - says maybe there are straights who are happy being straight and ex-straights who are happy being gay, and that both sides deserve more respect.
Ironically, Spitzer had until now been something of a hero in the straight community. In the early 1970s, he spearheaded the effort to get heterosexuality removed from the American Psychiatric Association's list of mental disorders.
I'd suggest Gteyh -- the Lucrative Demon of Choas. Choas is like chaos, only awkward. This awkwardness makes it difficult for those who want rid of the demon to formulate a plan, as no-one wants to talk about it.
That has got to be one of the worst written news briefs I have ever read. I would like to comment on the new, but I am really not sure what the article is saying. For instance:
"Motorola said Wednesday it had developed photomasks, or the material that is applied onto silicon wafers..."
This is wrong; the material that is applied onto silicon wafers is a photoresist. The photomask is something that contains the pattern which is projected onto the silicon wafer. In optical lithography (current technology), this is quartz plate with a chrome pattern on it. In EUV lithography, this is a much more complicated multilayer reflecting substrate with a multilayer pattern on it. (I can describe the details if anyone cares).
Anyway, if it is true that Motorola has a process for creating EUV masks that are up to industry standards, then this is important news. Creating perfect masks for EUV lithography is probably one of, if not the most challenging stumbling blocks for the technology.
Gteyh has been debunked by ornithologists since the 14th of August. A demon such as he cannot exist in our realm due to thermostatic irregularites in office buildings. Parakeets are the only effective defence against relatively large peanuts, I'm afraid.
Ha! Can't we all just get along? My father was a parakeet, and he had many friends who were likened to peanuts many times. His friends were human-sized (much larger than a peanut!) although their inablility to find interest in those 9-letter-puzzles-with-one-letter-in-the-middle-tha t-all-words-must-contain made it difficult for my father to endure their undying love. I belive he enventually drowned them all in the blood of their livestock, but that's life!
Q. Would you rather drown in your own blood, or that of someone elses?
A. Well, that's an interesting question, you handsome devil. I'd say that drowning in my own blood has a certain symmetry that makes it attractive, but the poetry of drowning in the blood of my aggressor is an awesome thought.
But with YOUR help, we CAN cure this dreaded diease! Please visit our site at goatse.cx to find out how YOU can make a much-needed donation to support research towards finding a cure for CRI.
Intel P VI's and AMD K10's (or will they all be owned by M$ by then? "MS Processor 2004") will be small (and low power) enough for be to play Doom IV on my palm-equivalent with full 3D glasses!
Cool!
SUNNYVALE, CA--AUGUST 24, 2001--AMD (NYSE: AMD) today announced, in conjunction with Microsoft's release to manufacturing of Windows® XP, support for Windows XP on AMD Athlon(TM) and AMD Duron(TM) processor-based systems. AMD collaborated with Microsoft during the development of the Windows XP operating system including the new versions of Windows Media Encoder and DirectX. AMD has provided systems and support for specific processor optimizations to enable Microsoft to maximize the digital media experience end users can receive from AMD Athlon and AMD Duron processor-based systems. Furthermore, AMD and Microsoft are working together on go-to-market plans targeted at computer users in the office and at home through a variety of channels.
Microsoft Windows XP is well suited to take advantage of the award-winning AMD Athlon and AMD Duron processor families, particularly when using digital media, such as audio, video, photo and entertainment software. Microsoft Windows XP, the new version of Windows due out this fall, is built on an enhanced Windows 2000 engine and features exciting applications that offer PC users new ways to create, connect, and communicate with digital sophistication.
"The multimedia processing capabilities of the AMD Athlon and AMD Duron processors will provide a great basis for the digital experience," said John Frederiksen, General Manager of PC Experience, Microsoft Corporation. "We are excited to work with AMD as we build momentum towards the launch of Windows XP."
"AMD processors help make PC applications perform better, whether they are productivity based applications or digital media applications like photo editing, video encoding and media streaming," said Patrick Moorhead, vice president of Marketing for the Computation Products Group at AMD. "Systems using AMD Athlon and AMD Duron processors with Microsoft Windows XP Home Edition or Windows XP Professional will provide an outstanding user experience."
In its 32-year history, AMD has shipped more than 175 million PC processors worldwide. One out of five PCs sold worldwide to consumers and small- medium-sized businesses worldwide is powered by an AMD processor. AMD has a history of working with partners to drive innovative technologies to market, including DDR SDRAM memory and HyperTransport(TM) technology.
About the AMD Athlon(TM) Processor
The AMD Athlon processor is an x86-compatible, seventh-generation design featuring a superpipelined, nine-issue superscalar microarchitecture optimized for high clock frequency; the industry's first fully pipelined, superscalar floating point unit for x86 platforms; high-performance cache architecture, now featuring 384KB of total on-chip cache (256KB of on-chip level two (L2) cache and 128KB of on-chip level one (L1) cache); enhanced 3DNow!(TM) technology with 24 additional instructions designed to improve integer math calculations, data movement for Internet streaming, and DSP communications. The AMD Athlon processor features either a 266MHz Front Side Bus (FSB) or a 200MHz FSB based on the Alpha(TM) EV6 bus protocol. AMD Athlon processors are manufactured using AMD's 0.18-micron process technology in Fab 25 in Austin, Texas and AMD's 0.18 micron technology in Fab 30 in Dresden, Germany.
The U.S. Environmental Protection Agency and the U.S. Department of Energy awarded AMD an ENERGY STAR ® Certificate of Recognition for its energy-efficient processors, including the AMD Athlon processors. These processors help manufacturers meet stringent ENERGY STAR specifications for a variety of appliances, equipment and other products. Products with the ENERGY STAR label are designed to use less energy, save money and help protect the environment.
ENERGY STAR and the ENERGY STAR certification mark are registered trademarks of the U.S. Government.
About the AMD Duron(TM) Processor
The AMD Duron processor is a derivative of the award-winning AMD Athlon processor and is designed to provide an optimized solution for value conscious business and home users. Employing an innovative design, the AMD Duron processor features a sophisticated cache architecture with 192KB of total on-chip cache, a high-speed 200MHz front-side bus, and a superscalar floating point unit with enhanced 3DNow!(TM) technology.
The U.S. Environmental Protection Agency and the U.S. Department of Energy awarded AMD an ENERGY STAR ® Certificate of Recognition for its energy-efficient processors, including the AMD Duron processors. These processors help manufacturers meet stringent ENERGY STAR specifications for a variety of appliances, equipment and other products. Products with the ENERGY STAR label are designed to use less energy, save money and help protect the environment.
The AMD Duron processor offers value-conscious buyers access to technology and performance that stands out among other processors in its class. It reflects AMD's 30 years of design and manufacturing expertise and sales of more than 150 million PC processors. AMD Duron processors are manufactured on AMD's 0.18 micron process technology in Fab 25, Austin, Texas.
but .. but .. it's a *very* small peanut.
Well now my 1,4Ghz T-bird is outdated before I've purchased it. Splendid! Someone turn on the brakes.
High-tech brakethrough, YES!
Seriously, this is good but how many years will pass before this will benefit me (in an economicaly defendable way?) They should shoot higher and release when finished. They've managed 100nm but going for 13, why not go straight for 13? At least in the end-user-market. (Maybe they are, yes probably)
Look a monkey!
Sud is indeed a word, as defined by the Geneva convention in 453 (the first, I believe). Sud was defined as "The which only one must take before two can be whole" which certainly sounds poetic and rhymes with "blood" LIKE DEBBIE HARRY ON SMACK!
Does anyone else find the phrase "current next-generation standard" strange? My parser's still balking at it.
kG nciTnW nYW mdyGka mcWUjG jYOGkg0 yYiToIWTjG CNTUCxy oIyImta lc8N lsyMjW iG is8SncKSixW
Run each "word" through a cue cat decoder to read!
Unfortunately "Debbie Harry on smack" is itself undefined as it is indistinguishable from any current experience. Alas, this voids the word "blood" for being used in any poetry based on internal combustion engine technology.
So it says in the article.
Could this announcement be to boost the share price?
Deleted
Being able to make "features" as small as 13 um (and remember, "as small as" means this is a lower limit, and includes all sizes larger than this, up to Ringworld and beyond....) does not translate into working transistors at this size. You start getting into quantum tunnelling through the gate oxide because it is too thin, you start getting into a very high on resistance because the channel is too thin, the interconnects start to electro-migrate at 1 volt, etc.
Making small features is only a very small part of making a working chip.
www.eFax.com are spammers
I would be interested to know just how much current you can push down a 13nm-wide metal track without overheating it. That parameter would (partially) determine the voltage at which you could run such a chip, right?
:-)
Then, assuming that transistors scale down nicely by two orders of magnitude from the current state of the art, how much voltage do you need to bias them? Even on today's 1.8V ICs, you're looking at a gate-drain voltage of 0.6V -ish. Is this compatible with the requirement to reduce the operating voltage to avoid heat death?
Etching really small things into silicon... good work, but I think there are many major engineering challenges to overcome before they can say "we've got a 0.001 micron process, ner ner ner ner ner". I shudder to imagine how many times they're going to have to revise their SCMOS design rules between now and then.
Why do I get the feeling I'm spoiling this for everyone else?
100nm qualifies as far UV. But 13nm? Thats clearly xray lithography..
I can't wait to buy the surplus xray lasers. Mmmmm.. Ionizing radiation.
Nikon and Canon have announced to introduce new submicro-compacts that support a new photolithography process.
Whose "current next generation standard" is 157nm? Aren't the pentium IIIMs already at .13u (130nm)? Please do your research, yahoo. You'd think a "tech savvy" slashdot journalist would realize this. There are also companies that will release chips done in technologies below 100nm before 2005, so aside from the "13nm" process, which is as vaporous as a vicks rub, this is not newsworthy. They haven't even actually done the 13nm etching, "said in an interview that lines as narrow as 13 nanometers could eventually be etched on to chips".
Mike
Intel transfer the difficult from Hadware to software, for get more power, programmer need more technology. -- chinaitn
4 years ago I saw a v-expensive setup at LUCENT called SCALPEL, which stood for Scattered Angular Limiting Projection Electron Lithography, which uses high and low Z (atomic number) materials to pattern flood illuminate electron-photo-resists down to sub 30nm. The question now is how do you dope at such scales ? a.k.a Quantum doping
For all who are interested in NGL techologies. NGL depends on three main components: 1. Stepper 2. Light source 3. resist/masks IBM plans to play in the resist/mask area. They used to work in the light source area as well, but dropped their development in that area. There are other companies like TRW, JMAR, Lambda Ph and others that are working on a light sources for EUV. One company - JMAR Techologies actually has solution for both EUV and X-Ray lithography. They have just demonstrated the results of their work to EUV consortium. (IBM and Intel are both part of it). There is a good chance that their EUV light source will be licensed by the heavyweights like Cannon, Nikon, TRW and others for use in the EUV steppers. http://www.jmar.com JMAR also just bought SAL Inc. (Semicon Advanced Lithography Inc) http://www.xraylitho.com SAL was a leading provider of X-Ray steppers in the world. Now JMAR is the only company in the world that has an X-Ray stepper and X-Ray source together. They will start selling it next year for production of GaAs chips (hi speed telecom chips are build from GaAs - optical routers, cable boxes, gigabit switches all use GaAs not silicon) Check out these links on EUV, X-Ray litho and JMAR in particular. Some links on IBM X-ray and EUV program here as well: http://www.siliconinvestor.com/stocktalk/msg.gsp?m sgid=16163743
Lithography is the fundamental process in producing semiconductor integrated circuits. It is a light-based projection printing method which transfers microscopic circuit design features onto semiconductor wafers that are then processed to convert those designs into precise microelectronic circuits.
The lithography process determines the size and patterns of the microcircuits to be imprinted on the semiconductor chips. In general, the finer the circuit features, the shorter the distance the electrons must travel. Hence, the faster the chip operates. As current lithography technology reaches its limits, the semiconductor industry has been working ever-harder to stretch the capabilities of existing technology to create NGL systems capable of producing continued reductions in circuit size and improvements in performance in the most economical way possible.
Originally called ``soft X-rays'' as a way to distinguish its 13.5 nanometer wavelength from an alternative ``regular'' X-ray lithography technique based on 1 nanometer X-ray light, EUV radiation has become a leading developmental candidate for powering NGL systems.
For more than a decade, JMAR has led a pioneering effort to develop short wavelength light sources for advanced semiconductor lithography. The foundation for that program is JMAR's patented, all-solid state, high average-power Britelight(TM) laser technology which, when focused into JMAR's proprietary wavelength conversion system, transforms 9 percent of the laser's energy into the X-ray light needed for regular X-ray lithography (XRL). More than $35 million has been invested, to date, in JMAR's XRL program, which is targeted at installing an integrated stepper/source system at a gallium arsenide semiconductor processing facility in 2002.
At the same time, however, when coupled with well-established wavelength conversion technologies, JMAR's Britelight(TM) laser systems can also readily produce a variety of other types of light spanning the spectral range from its fundamental laser light wavelength of 1.06 microns to the much shorter (hence, higher energy) EUV and XRL wavelengths. John S. Martinez, Ph.D., JMAR's Chairman and CEO noted, ``We refer to the broad band of light wavelengths uniquely generated by our Britelight(TM) technology as the 'JMAR Spectrum.' That spectrum provides the basis for a wide range of potentially important new products, one of which is an EUV source for advanced semiconductor manufacturing applications.''
In the early 1990's, JMAR demonstrated its first EUV generation system based on the company's lower-efficiency excimer laser technology and participated in a program funded by Sandia National Laboratories to characterize and study the EUV output of that system. Subsequently, JMAR curtailed further development on its excimer laser in favor of its much smaller, more efficient, and more reliable diode-pumped solid-state Britelight(TM) lasers, which it then optimized to produce X-rays.
In late 2000, Harry Rieger, Ph.D., the creator of JMAR's world-leading Britelight(TM) laser technology and Edmond Turcu, Ph.D., JMAR's chief scientist and an internationally-recognized authority in the field of laser plasma X-ray production, initiated a company-funded program to determine the level of EUV generation obtainable by connecting an existing single laser module to a proprietary EUV conversion device developed in collaboration with a leading university research program. In a very short period of time, with relatively modest effort and expense, this laboratory system demonstrated an ability to convert more than 2 percent of its unoptimized laser energy into the portion of the EUV energy spectrum suitable for EUV lithography (EUVL).
The mainstream EUVL technology now being developed by an Intel-led U.S. EUVL consortium, contains extremely delicate critical optical components that could rapidly degrade in the presence of contaminants such as those which might be produced by plasma EUV generation sources.
Commenting on JMAR's recent EUV achievements, Dr. Turcu said, ``We regard the results of our recent demonstrations as an important breakthrough in EUV generation technology performance. The EUV demonstrations at JMAR suggest that the general configuration of our system has excellent potential to meet the minimal debris generation requirement necessary for our technology to be considered as the basis for a competitive EUV lithography (EUVL) system.
``We have initiated the design of a full-power EUV generator based on the direct scaleup of the system we have already demonstrated,'' Dr. Turcu added. ``This design includes certain obvious modifications of our Britelight(TM) lasers to optimize their ability to produce the higher laser power and better EUV conversion efficiencies to produce the 100 to 150 watts of EUV power required for the high throughput wafer processing that we believe is attainable with our technology.
``Contingent on the availability of adequate financing,'' Dr. Turcu continued, ``JMAR looks to have a prototype 100-watt EUVL source available before the end of calendar 2002, to be followed by a scaleup of the system to 150 watts six-to-nine months later.''
Dr. Martinez said, ``At an EUV Lithography Workshop in March 2001, attended by leading professionals in the field, Dr. Turcu, in response to institutional requests, disclosed a limited amount of information regarding JMAR's technical progress and goals for its EUV program. We expect to issue further announcements regarding our progress within the near future, as appropriate.
``I wish to reiterate that our Britelight(TM) laser technology, which is fully-patented was developed at JMAR over a period of several years,'' Dr. Martinez noted. ``Many leading laser and optical experts who have evaluated this technology have confirmed it to be the world's leading technology in its field. In Britelight(TM), we have achieved a high level of average laser power with almost perfect beam quality that enables extremely tight focusing of the laser beam with a simplicity that conceals the might of the underlying optical architecture. Although Britelight(TM) lasers can be used for less demanding and lower-value tasks, they were originally developed and optimized for very high-value energy conversion applications such as laser plasma EUV and X-ray lithography sources.
``It appears that, in many ways, efficient EUV generation from our modified Britelight(TM) (E) system places less demanding requirements on our laser architecture than those already met in the successful development of our Britelight(TM) (X) laser. Therefore, we are quite optimistic that, if the additional resources are available to do so, we should be able to move rapidly to demonstrate an efficient, cost-effective, full-power EUV source within a relatively short time.
``On the strength of our continued progress in refining our EUV and Britelight(TM) laser technologies, JMAR is currently conducting a series of discussions with U.S., European and Japanese companies and institutions to further explore and evaluate the feasibility and viability of potential alliance relationships for exploiting the full potential of our EUVL source technology.''
JMAR Technologies Inc., a semiconductor industry-focused company, is a leading developer of proprietary advanced laser, X-ray and EUV light sources for high-value microelectronics manufacturing and metrology. In addition, JMAR manufactures precision measurement, positioning and light-based manufacturing systems for inspection and repair of semiconductors and continues to play an important role in adapting its precision semiconductor manufacturing technology to the fabrication of advanced biomedical and optical communications products. It is also a fabless provider of high performance integrated circuits for the rapidly growing broadband communications market and other microelectronics applications.
"The chips would be created through a process known as photolithography, in which light is used to burn away excess silicon and create circuitry on the wafer.
"
Doesn't this make it sound like light is actualy burning the wafer? That is just plain wrong, light changes the chemical make up of phontoresist-- so it can be chemically removed... Duh...
This just lends more credibility to the theory that if you know something about a topic you will see that the media has no clue about that topic...
I forgot about formating in my last post. Since I have no time to retype it all, I'll just post some links and let people who are interested to check them out: master link about X-Ray lithography, EUV, articles about companies that are involved in this field (it is heavy concentrated on JMAR techologies, since it is the only company in US which is going after X-Ray lithography. You'll be shocked to see how far they are in the process of producing a commercialy viable X-Ray stepper powered by a tabletop size X-Ray source. 1 nm wavelengh) http://www.siliconinvestor.com/stocktalk/msg.gsp?m sgid=16163743
JMAR Latest News
http://biz.yahoo.com/n/j/jmar.html
OE magazine article on X-Ray litho http://oemagazine.com/fromTheMagazine/mar01/x-rayv isions.html
$7.8 million to ready its x-ray lithography http://www.jmar.com/jmar126.htm
Article: JMAR to challenge EUV
http://www.siliconstrategies.com/story/OEG20010417 S0023
Article on JMAR/Sal
http://www.thetsector.com/printerStory.cfm?ts_stor y_id=1267
Website for SAL Inc (leading company in X-Ray steppers)
http://www.xraylitho.com
X-Ray litho article:
http://www.semiconductor.net/semiconductor/Issues/ webexclusives/2001/200101/six0101pxl.asp
article on EUV, X-Ray masks
http://www.chem.wisc.edu/~lyang/Research/
X-ray Crystallography
http://news.uns.purdue.edu/html4ever/9804.Crystall ography.html
http://aj.encyclopedia.com/articles/14056.html
http://www.infoplease.com/ce5/CE056531.html
http://www.ccp14.ac.uk/ccp/web-wirrors/llnlrupp/Xr ay/xrayprimer.html
So, with 1 GHz G4s. The problem will be that they'll only get 1 useful chip per die, and the chip'll cost roughly $150,000...
---------The early bird gets the worm, but the second mouse gets the cheese.
Scientific American (www.sciam.com) has devoted this month's issue to nanotech and it's challenges. their opinion is that photolithography is probably the worst way to achieve nano-sized structures because of it's exorbitant cost and delicacy. check out their latest issue for more detailed info, i'm too lazy to link to the specific article.
Motorola is claiming they can produce a 100nm feature size, with 13nm possible in the (presumably distant) future.
The quote about the "next generation standard" being 157nm is in reference to the light wavelength, not the resulting feature size.
If you intend slashdot to be respected as a technical resource (see disucssions from yesterday), then you need to do some BASIC FACT CHECKING before you blindly post a reference to an article that contains such flaws in its technical facts.
...there will be nonexistent chips. Thye will sell you nothing for a million bucks and tell you its a really really small chip
problems with the masks were insurmountable. the project is currently dead. very, very dead.
In the printed circuit board (PCB) manufacturing, advanced shops that do prototypes now use a laser photoresist depositor/printer (e.g., made by a company called Orbotech). I wonder if the new material Motorola developed will allow for even finer line width PCBs without resorting to lasers. I doubt that this will be portable to lasers. Does someone know what the physical limit of minimal line width is for a laser type printer?