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Intel: Metal in Future Chips = Less Leakage (updated)

securitas writes "Intel is contemplating using metal instead of silicon in future chips for the 'transistor gate, which controls whether a transistor is on or off' and the 'dielectric, an insulating layer below the gate,' which are respectively made of silicon atoms and silicon dioxide. 'Millions of minuscule switches that make up silicon chips leak electricity when they're supposed to be shut off. To compensate, engineers have increased the current, driving up power consumption, decreasing battery life for portable devices and generating more heat.' AMD has also experimented with metal instead of silicon. By moving to metal AMD and Intel expect to reduce electricity leakage. More from AP via SeattlePI and the Miami Herald." Update: 11/05 15:25 GMT by T : Read on below for some information from Intel on why this is a good thing.

gManZboy writes "Following up on the Intel news that about using metal in chips -- here's an explanation from Shekhar Borkar (Intel Research Fellow) about why heat, power, and sub-threshold leakage, not transistor size, are the real challenges to Moore's law. Apparently, in order to make chips much faster, we're going to have to pump more electricity in then anything else in our houses -- and they'll soon be as hot as a nuclear reactor -- no, really."

54 of 240 comments (clear)

  1. Which metal? by msgmonkey · · Score: 2, Interesting

    I dont see any mention of the type of metal that would be most suitable. I'm sure all metals are n't created equal.

    1. Re:Which metal? by MikeD83 · · Score: 5, Informative

      In the AMD article the use of Nickel is mentioned.

    2. Re:Which metal? by Oo.et.oO · · Score: 3, Informative

      the materials for a capacitor's contacts have nothing to due with it's ability to store charge (thus its capacitance). it is only a function of the device's dimensions and its dielectric.

    3. Re:Which metal? by dustinmarc · · Score: 2, Interesting

      It's a secret. Intel isn't saying what the material is, just that they've discovered a probable solution to fix the achilles heel of the chipmaking industry.

      Basically, they are saying that they have found two new materials with a high k dielectric that reduces current leakage by more than a 100 times silicon dioxide and hopefully plan to use it by 2007 in production. They also have tested the materials and had excellent results in a lab environment. Still, they are being vague on the details, and who can blame them if this stuff is as good as they say it is.

      Skeptic or beleiver? I guess that's a matter of opinion. But Intel thinks that this will keep Moore's law true for quite some time. In the past if Intel claims they have been able to stay true to Moore's law it's been true. Heck, the can't lie, Moore is the founder of the company.

      --


      Microsoft should hire me. I can write code that doesn't work faster than the guys they have doing it now.
    4. Re:Which metal? by Cougar1 · · Score: 5, Informative

      I dont see any mention of the type of metal that would be most suitable. I'm sure all metals are n't created equal.

      Actually, two types of metal are probably needed. One for nmos transistors and another for pmos transistors. Nmos and pmos transistors have different threshold voltages (the voltage at which the device turns on), but ideally you would like both types of transistors to switch at the same voltage. The threshold voltage of a device can be shifted by modifying the "workfunction" of the gate metal. The workfunction is the energy required to remove an electron from the metal surface.

      One reason polysilicon gates are used in conventional CMOS is that the workfunction of polysilicon can be modified by changing the level of doping and the type of dopant material (usually B, P or As). Thus, polysilicon gates can be used for both nmos and pmos transistors and by varying the doping, both types of devices can have the same threshold voltage.

      Shifting the workfunctions of metals, using dopants is not so straightforward. As a result it will probably be necessary to use two different metals having different workfunctions for nmos and pmos transistors. Further complicating matters is the fact that the gate metal can interact with the dielectric material, modifying the effective workfunction and thus the threshold voltage. So, while the isolated metal may have the necessary workfunction, the workfunction may shift when the metal is part of a device. Thus, a lot of testing and experimentation is needed to find a metal that has the proper workfunction after it has been put into a device.

    5. Re:Which metal? by geekee · · Score: 2, Informative

      Yes, the type of metal is important due to the workfunction of the metal. This determines the potential interactions between the semiconductor and the metal, which affects things like device threshold voltage.

      --
      Vote for Pedro
  2. Heh by rwiedower · · Score: 2, Insightful

    The changes are largely necessary because of the unsavory consequences of Moore's Law, the famous dictum that states that the number of transistors on a chip doubles every two years. Yeah, it's all that pesky "Moore's Law" fault...

    1. Re:Heh by Alien54 · · Score: 2, Insightful
      Apparently, in order to make chips much faster, we're going to have to pump more electricity in then anything else in our houses -- and they'll soon be as hot as a nuclear reactor -- no, really.

      This makes sense, even from the view point on increasing density and complexity of data alone being packed into smaller and smaller containers. Even if you only allocated 1 electron per bit, after a while all of those bits start to add up. Unless you go to another system.

      As an example, people often cite the human brain, with all of it's nueral connections and pathways. But this might not be all that is going on.

      Biomineralization of ferrimagnetic magnetite is known to occur in a number of organisms including animals. Recent investigations have revealed the presence of biogenic magnetite in human brain tissue as well. The presence of magnetite in the brain has been established using a variety of magnetic and electron microscopic techniques.

      This has interesting implications for data processing in the brain, as well a exotic areas of research into the phenomena of consciousness

      Regardless of your opinion on the above (some of which is highly speculative), this leads us to the vision of a computer technology where not not only electronics states are used for data processing, but magnetic ones as well.

      --
      "It is a greater offense to steal men's labor, than their clothes"
  3. Metal Implants? by telstar · · Score: 5, Funny

    Man, and here I thought silicon felt weird.

  4. Copper? by Anonymous Coward · · Score: 2, Insightful

    I swear I remember IBM moving to copper for chips a while back (C.2-3 years ago). Was it for production chips or just R&D purposes?

    Is this just a question of Intel playing catch-up?

    1. Re:Copper? by msgmonkey · · Score: 5, Informative

      You are thinking of the Copper traces instead of Aluminium, the transistors remained Silicon. Here they are talking about metal transistors.

    2. Re:Copper? by DarthTaco · · Score: 4, Informative

      You are thinking of the Copper traces instead of Aluminium, the transistors remained Silicon. Here they are talking about metal transistors.

      Not true at all. The copper in IBM's process is for interconnects, not traces. I'm not sure what metal they use for the traces, but it's probably aluminum and definitely not copper. The connection between layers (interconnect) are copper plugs.

      The metal intel is talking about is strictly for the gate terminal connection of the transistor. The transistor is still doped silicon or gallium arsenide or whatever semiconductor they are using.

    3. Re:Copper? by msgmonkey · · Score: 3, Informative

      Nope, the traces are copper instead of aluminium here is an IBM article from 2000. Unless "wiring" and "traces" no longer mean the same thing.

  5. Silicon? Leakage? by wickedj · · Score: 2, Funny

    Yeah, I hate it when my silicon breaks and creates leakage.

  6. Metal dielectric!? by CaptainAlbert · · Score: 4, Funny

    I have no trouble understanding a switch from poly to metal for gate connections... but a metal dielectric? That seems to run counter to common sense. The dielectric is, by definition, required to be an insulator, whereas metals, also by definition, conduct electricity rather well. What is this magic substance?

    I love this site sometimes - where else can you post completely clueless questions and be virtually guaranteed to get an intelligent response from at least two people with PhDs in semiconductor physics? :-)

    --
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    1. Re:Metal dielectric!? by brassman · · Score: 2, Interesting

      A metal dielectric does sound like voodoo... but at the scale they're describing -- four ATOMS thick!? -- I suspect it's more of a waveguide (or perhaps a forcefield) than a physical barrier.

      --
      "Ain't no right way to do a wrong thing."
    2. Re:Metal dielectric!? by kinnell · · Score: 2, Funny
      The dielectric is, by definition, required to be an insulator, whereas metals, also by definition, conduct electricity rather well

      Perhaps they are using some kind of unobtanium alloy with phlogiston repelant properties

      --
      If I seem short sighted, it is because I stand on the shoulders of midgets
    3. Re:Metal dielectric!? by Drakin · · Score: 2, Interesting

      Well, if I recall correctly, tantalum oxide is dielectric, so it's possible that they it, rather than a pure metal.

      Pure tantalum on the other hand, is a great conductor.

    4. Re:Metal dielectric!? by Cougar1 · · Score: 3, Informative

      The dielectric layer mentioned in some studies is Hafnium dioxide (HfO2). This is an insulator, not a conductor. HfO2, is good because it is a high-k material and it is thermodynamically stable in contact with Si.

      One reason for replacing polysilicon with a metal is that the HfO2 layer is not compatible with the polysilicon deposition process. Defects form in the HfO2 layer during the polysilicon deposition step. Another reason for replacing poly with a metal is to avoid poly depletion effects. Essentially, poly still behaves as a semiconductor, so a charge depletion layer forms near the poly/dielectric interface. This depletion layer acts as an insulator and has the same effect as increasing the thickness of the dielectric layer (which is what we're trying to reduce). The increased thickness reduces the capacitance, which needs to be large for the transistor to function properly. Unlike semiconductors, metals do not form a depletion layer.

    5. Re:Metal dielectric!? by inl101 · · Score: 5, Informative

      I'm about 6 months away from my PhD in semiconductor physics.

      They mean metal oxides. Leading candidates are Halfnia and Zirconia. These are "High-K dielectrics".

      Using both reduces the Effective Oxide Thickness (EOT) of the gate dielectric. For the same thickness material, high-k dielectrics look like a thinner amount of silicon dioxide. Metal gates eliminate depletion effects in the gate (poly-depletion), which also makes the oxide look thinner.

      With lower EOT, the gate has better control of the channel, so leakage goes down.

    6. Re:Metal dielectric!? by Cougar1 · · Score: 4, Informative

      Tantalum oxide is a good high-k dielectric, but it is not thermodynamically stable in contact with Si. As a result, Ta2O5 reacts with Si during the high temperature (>900 C) anneals necessary to activate the Si dopants. These unfavorable reactions ruin the devices and as a result Ta2O5 has largely been abandoned as a potential dielectric in Si transistors. Ta2O5 is used for capacitors in DRAM memory devices.

  7. Time for change... by stm2 · · Score: 5, Funny

    to MetalValley!

    Now, instead of "experiment in silico", it would be "in metal" (??) or "in Fe|Au|Cu" :)

    --
    DNA in your Linux: DNALinux
  8. What about... by the_bahua · · Score: 5, Interesting

    ...diamonds?

    I thought that the manufacture of diamonds was set, and only needed to step up its production. Gemesis has been making, for less than $100, gems that would be worth hundreds of thousands if naturally mined.

    The most promising thing about these diamonds is that, being cheap, they open the door for cpu cooling. Diamonds are tolerant of exponentially higher temperatures than silicon, so why aren't we hearing about intel, amd, motorola, ibm, TI, and sgi taking advantage of this new technology.

    Metal? What about metal is unprecedented? What about it has kept us from using it before? Diamonds are the future, not metal.

    1. Re:What about... by October_30th · · Score: 4, Insightful
      Intense lobbying, FUD and outright threats from the diamond industry have managed to suppress any large scale production of perfect diamonds (you can't do chips using crude industrial grade diamonds).

      You see, diamonds are seriously overpriced luxury items. Although it is possible to manufacture cheap diamonds that are indistinguishable from the natural ones, it has never been done. Why? It would ruin the entire business model of De Beers & co. which is based on artificial scarcity. That's why they'd fight such projects to the bitter end.

      --
      The owls are not what they seem
    2. Re:What about... by tyroney · · Score: 2, Informative
      Did you miss that whole bit about how there are at least two people that are making rocks that are only distinguishable from "real" diamonds because they are better?

      Just checking, because it souded like these people were hoping to do just what you mentioned as being heavily fought. And so far, they haven't been killed as far as I know.

      I, for one, welcome the death of our diamond-scarcity-based overlords.

    3. Re:What about... by l3prador · · Score: 5, Informative

      Actually, it's currently being done by Apollo Diamonds and Gemesis, which was mentioned above. De Beers is fighting them as hard as they can, but even if they convince the public that manmade diamonds aren't worth anything as jewelry, they will still be able to use them for computing. However, production is not quite ready for large-scale chip manufacturing, which is why Intel and others have not yet turned to diamonds.

    4. Re:What about... by mentaldrano · · Score: 2, Informative
      Diamonds? Until the diamond fabrication process becomes much more advanced, diamonds are a waste of time. Impurities are the culprit here. Many impurities = low mobility electrons = crappy chips.

      Electrical grade silicon (EGS) has a long purification process that it must go through to be of sufficient quality to make chips from. To give an example, there are roughly Avogadro's number of silicon atoms in one cubic centimeter of silicon (5.5x10^22 atoms / cc). After being purified, the MAXIMUM impurity concentration is ~10^14 atoms / cc. This is around 1 part per 100 million. The best laboratory grade Si is 100 times better than that!

      Contrast this with diamond: even the best artificial diamonds have so many impurities that you can see them with the naked eye. So even if diamond semiconductor chips can be made (SiC is much more likely) we won't be able to use them for anything like what we do now until the purification process is improved.

  9. Re:Alien Technology? by SharpFang · · Score: 2, Funny

    Now how can you say that CPUs are based off of alien technology when Intel is making changes like this?

    They just caught a new flying saucer.

    --
    45 5F E1 04 22 CA 29 C4 93 3F 95 05 2B 79 2A B2
  10. From Intel's site... by sczimme · · Score: 4, Informative


    The history of Moore's Law.

    Or if you are interested in Moore's original paper, you can find it here.

    --
    I want to drag this out as long as possible. Bring me my protractor.
  11. Clueless, thy name is reporter by overshoot · · Score: 5, Informative
    To clarify: the idea is to use a gate dielectric which has a higher dielectric constant than silicon dioxide. Most of the candidates are metallic oxides, nitrides, etc. That allows the transistors to have thicker gates for the same gate capacitance (which is how MOS transistors work).

    The chemistry of the non-silica gate dielectric requires that the gate itself be non-silicon, and metals are better conductors anyway. (For larger transistors, we're already running into trouble from the distributed resistance of the gates.)

    Hope that helps.

    --
    Lacking <sarcasm> tags, /. substitutes moderation as "Troll."
  12. Isn't this old news? by wazzzup · · Score: 3, Funny

    I thought it was already established that silicon implants were prone to leakage.

    But switching to metal? Man, I'd hate to walk outside on a cold Montana morning in February with those.

    What's that? Silicone? They're not the same? Never mind. Carry on. Sorry.

    So you're telling me SOI is NOT a busty gal in an angora sweater?

  13. Hadn't IBM already done this by adzoox · · Score: 4, Interesting
    I was aware that IBM's copper on silicon insulator already acheived less leakage and less power consumption, also increasing power (per Mhz) in each cycle. G3's (for Apple Computers have had this for over 2 years) and G5's also have it.

    Interesting how IBM has discovered that moving to metal for processors and away from metal for hard drives. (Newest Hitachi/IBM notebook drives use Pixie dust which is actually glass. The platters in these hard drives are also ferro impregnated glass platters)

    --
    Yell & scream & rant & rave... it's no use... you need a shaaaave ~ Bugs Bunny
    1. Re:Hadn't IBM already done this by Oo.et.oO · · Score: 2, Interesting

      you are thinking of SOI (silicon on insulator) which allows for less DRAIN current leakage to the substrate. this of course has nothing to due with the copper interconnects in the BEOL.

      all existing technologies in production (AFAIK) use poly gates as it survives the anneal and etching steps which copper and aluminum could never do in current configurations

    2. Re:Hadn't IBM already done this by adzoox · · Score: 3, Interesting

      No, the SOI is something different - it IS used in the G5's but G3's (750fx & Gx) used copper interconnects as well. It was the way that IBM figured out how to make the G3 so effiecient. The 900Mhz G3 is probably the coolest/best performing/per Mhz of any processor released in the past 3 years.

      --
      Yell & scream & rant & rave... it's no use... you need a shaaaave ~ Bugs Bunny
    3. Re:Hadn't IBM already done this by mentaldrano · · Score: 3, Informative
      No, IBM has gone to copper interconnects, which have lower resistance than the current aluminum ones that everyone else uses. IBM's innovation was finding a way to keep the copper from sinking into the silicon and ruining the delicate transistors underneath.

      Intel is actually talking about replacing the gate dielectric (which is silicon dioxide currently, even at IBM) with a metal or metal oxide, which has a higher dielectric constant. Higher dielectric constants mean a more effective gate for the same thickness, or the same gate effect for a thicker layer (and hence less leakage).

      Intel is also apparently talking about replacing the polysilicon gate with an actual metal gate. Polysilicon is used for gates because it doesn't melt when the chip is annealed (an important processing step), like metal would. Intel's innovation is apparently figuring out a way to get around this problem.

    4. Re:Hadn't IBM already done this by addaon · · Score: 2, Interesting

      The 900Mhz G3 is probably the coolest/best performing/per Mhz

      Except of course for the same chip (the 750FX) at, say, 600MHz, or less. The G3 is seriously bandwidth-starved in most configurations I've seen (it supports a 200MHz FSB, but I've never seen it used with more than 167); scaling down the clock-speed gives sub-linear decrease in performance, linear (well, close enough; moreso than for most non-arm chips) decrease in heat and power consumption.

      Don't get me wrong, the 750FX is, in my opinion, the nicest piece of silicon yet produced (and I'd much rather have a 4-core G3 than a 1-core G5 with the same number of transistors)... but people (and, of course, in particular apple) need to realize that this chip had dual phase-locked-loops and takes less time to switch clock speeds than to switch processes... dynamic scaling is Good, constant 900MHz (or 900MHz and then, blindly, 600Mhz when unplugged from the wall) is Silly and Bad.

      --

      I've had this sig for three days.
  14. Re:say what? by stevel · · Score: 4, Informative

    Why is VLIW not more popular? Because compiler technology isn't yet good enough and current VLIW designs have restrictions that get in the way of the best performance.

    Over the years, there have been many attempts to use techniques such as VLIW, which sound great on paper, but don't do well in practice. What have worked the best, at least through the 90s, are architectures that do a lot of simple things fast.

    You can make VLIW fast, Intel has managed that, but at great cost in both silicon and software.

    Be careful when making generalizations about a processor line such as the P4 - there have been quite a few P4 generations, each better than the last. Latencies have gone down.

    I think that parallelism (eg. HyperThreading, multicore, etc.) is where the real-world performance gains will come from. Single-threaded benchmarks don't accurately reflect realistic workloads.

  15. They call it Low-K Dielectric by OS24Ever · · Score: 2, Informative

    Here is an article explaining low-k dielectric. I believe this is a shipping product on the Power4/4+ based systems and it is in the EXA chipset on the x365/x440/x445/x450 Intel servers, and the Apple G3 and G5. The xSeries products even have little copper BB's in the grill of the system to symbolize that they use copper based technology.

    --

    As a rock-in-roll Physicist once said, No matter where you go, there you are.

    1. Re:They call it Low-K Dielectric by overshoot · · Score: 2, Informative

      Different subject. Up in the metal interconnect layers, you want low-K to reduce capacitance between unrelated signals. Down at the gate level, you want high-K dielectrics to make it possible to induce a reasonable channel charge at low voltages and practical gate thicknesses.

      --
      Lacking <sarcasm> tags, /. substitutes moderation as "Troll."
  16. Gee, moving back to metal gate fabrication? by dido · · Score: 3, Insightful

    My course in VLSI design was many, many years in the past, but what I do remember is that early integrated circuits used metal gates in the fabrication process. That process was later abandoned in favor of polysilicon because poly was much easier to work with at smaller feature sizes (I'm a bit foggy on this one). Gee, so now we're going back to metal gate processes, and we'll have real metal-oxide-semiconductor field effect transistors again?

    If this is becoming easier to do at deep submicron level, I suppose processes for making deep submicron feature-sized Gallium-Arsenide MESFET's also got easier? Now wouldn't we just love to have such GaAs chips on our desktops... (I do know I'm forgetting another difficulty in working with GaAs, anyone care to remind me why GaAs is not as common as silicon today?)

    --
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    1. Re:Gee, moving back to metal gate fabrication? by overshoot · · Score: 2, Informative
      That process was later abandoned in favor of polysilicon because poly was much easier to work with at smaller feature sizes (I'm a bit foggy on this one).

      Silicon gates can be self-aligning. Once you've got gate oxide, deposit a layer of polysilicon and pattern it, then use the remaining poly as a mask for the gates while the rest of the oxide is removed.

      I do know I'm forgetting another difficulty in working with GaAs, anyone care to remind me why GaAs is not as common as silicon today?

      There are several. The defect densities in compound semiconductors are much higher than silicon, limiting size. The materials aren't as mechanically stable as silicon, which also limits size due to misalignment. Also, complementary FET structures are hard to get right (which is why most compound semiconductor circuits today are basically bipolar.)

      I suspect that I'm also forgetting a few. It's been a while for me, too.

      --
      Lacking <sarcasm> tags, /. substitutes moderation as "Troll."
  17. Re:*Switching* to metal? by overshoot · · Score: 3, Informative
    Isn't Silicon a metal?

    No. The bonds between silicon atoms are covalent. A metal (e.g. copper) has a "cloud" of electrons free to move around in the lattice. Silicon is a semiconductor, with the charges bound to the atoms except when there's enough energy (typically thermal) to kick them loose.

    --
    Lacking <sarcasm> tags, /. substitutes moderation as "Troll."
  18. Some explanations and thoughts by fredrikj · · Score: 2, Funny

    Would metal really be able to replace silicon? IANAEE, but...

    Wait, that only works on the law forums. Darn.

  19. Heat=power by nagora · · Score: 2, Interesting
    If the chip in your computer is as hot as a nuclear power station, should you not do what power stations do and hook it up to a steam turbine?

    One day, your computer may be the ONLY thing in your house connected to the outside mains supply!

    TWW

    --
    "Encyclopedia" is to "Wikipedia" what "Library" is to "Some people at a bus stop"
  20. Re:The metal is Nickel... for AMD at least by mentaldrano · · Score: 2, Informative
    Yes, metals (like Nickel) do conduct electricity, but most metal oxides do not! I suspect the mystery Intel metal and the AMD Nickel dielectrics are actually metal oxides. The benefit of metal oxides is that they have huge dielectric constants (which make better capacitative gates). I believe the world champion dielectric material is actually an oxide of Tantalum, but I cannot remember off the top of my head.

    As for the phonon question: in crystals the quantum of atomic motion is called a phonon. Electrons can scatter off of phonons, reducing the mobility and hence increasing the resistance. Two ways around this: lower the temperature, which suppresses the creation of phonons, or use a heavier material, which is harder to move and hence phonons take more energy to create. Using a metal gate dielectric (heavier material) traps any phonon which touches it, reducing the concentration of phonons near the surface, where the conduction electrons are.

  21. Re:say what? by Zathrus · · Score: 2, Insightful

    Has anyone actually checked the specs of the P4? Things like 15 cycle multiplies, 1.5 cycle ADC/SBB, etc

    And yet it's still faster than virtually any other processor on the planet. Intel has come a long way from when it was being spanked by MIPS/Sun/etc. You can make an argument for Alpha, but that's about it.

    a non-x86 core

    The P3, P4, and Athlon cores aren't x86. They have a wrapper layer that translates x86 instructions into their own internal core instructions, but that's it. And, frankly, a more "efficient" core doesn't make a bit of difference if it doesn't actually have any use in the real world. The x86 ISA is here to stay for a long, long time. People have been predicting it's death since it came about, and yet it's managed to dominate every other ISA out there. Hell, it's being looked at for embedded use now of all things.

    Why should the CPU do the work of a compiler at runtime?

    Because the compiler doesn't know what the dataset is. You can make guesses, but that's all. If you really want to optimize then you have to actually run the program for a period of time using real world data and then re-compile with the profiling data you've gathered. Which is pretty damned expensive to do, and is invalidated if your data set changes (yeah, that never happens in the real world) or you want to sell the program to multiple companies (again, one of those rare edge cases). The fact of the matter is that it's far, far cheaper to upgrade the hardware than it is to spend a bunch of additional programmer time optimizing the software. You can whine and kvetch about this, but it won't change reality.

    Back when I was in college and was taking EE/CompE courses I couldn't believe how crappy the x86 ISA was either. And it is crappy. So what? It's still faster than everything else out there, it's cheaper than the competition, and the world has boatloads of software that runs on it. Do you have any idea how much software is used on a daily basis that hasn't been touched in years? How much do you think it would cost to replace all that software?

    Don't worry. One day you'll graduate too and after a couple years in the real world you'll discover that a crappy solution that fits the job is far, far better than a perfect solution that doesn't do anything.

  22. The Apollo process, not Gemma by TubeSteak · · Score: 2, Interesting
    The Apollo Method (Skip to the end of the article)
    1. Place diamond wafers on pedestal. Depressurize chamber to one-tenth of an atmosphere.
    2. Inject hydrogen, natural gas (CH4) into chamber. Heat with microwave beam. At 1,800 degrees Fahrenheit, electrons separate from nuclei, forming plasma.
    3. Let it rain. Freed carbon precipitates out of plasma cloud and is deposited on wafer seeds.
    4. Let it grow. Wafer seeds gradually become diamond minibricks, building up at half a millimeter a day.
    5. Open chamber and remove diamond brick. Slice into wafers for semiconductors or cut and polish to make gems.
    6. Profit!!!

    DeBeers and Co. are very very unhappy about these two technologies and what they're going to do to diamond prices. Both companies can create perfect diamonds and the second manufacturing process will allow (once its been scaled up) for diamonds to be used in electronics.

    But here's the reason the U.S. might just end up behind the technology curve:

    "Diamonds represent a seismic change in semiconductors," says Krishnamurthy Soumyanath, Intel's director of communications circuits research. "It takes us about 10 years to evaluate a new material. We have a lot of investment in silicon. We're not about to abandon that."

    ...frustrated with what he thinks of as myopia in the US computer business. "Europe and Japan have been investing in diamond semiconductor research," he says, citing the Japanese government's announcement in December that it would begin allocating $6 million a year to build a first-generation diamond chip...

    Also, some other posters have commented on impurities being a stumbling block for diamond-based electronics, how convienent that "CVD diamond precipitates as nearly 100% pure"
    --
    [Fuck Beta]
    o0t!
  23. Moore's Law is NOT a Law by G4from128k · · Score: 2, Insightful

    The changes are largely necessary because of the unsavory consequences of Moore's Law, the famous dictum that states that the number of transistors on a chip doubles every two years

    Moore's Law is only an empircal observation -- a convenient curve that fits through the our current data on time and transistor count. There are no gaurantees that this trend will hold for the future.

    The point is that no physical phenomena forces the doubling. At best, one could say that mental and procedural limits prevent doubling faster than Moore's so-called Law. Perhaps this is the more interesting Law -- that doubling can't occur faster than every 18 to 24 months.

    --
    Two wrongs don't make a right, but three lefts do.
    1. Re:Moore's Law is NOT a Law by JGski · · Score: 2, Insightful

      Moore's Law is a market imperative, which to a business is pretty much the same thing as a law.

  24. Re:So what they're saying is... by morcheeba · · Score: 2

    No, coppermine wasn't about using metal on gates. It was an all-aluminum (go figure!) interconnect scheme that used a low-k dielectric and thick wires for faster speeds. Only later did copper get used (and then again, only for the interconnects, not the gates)

  25. Re:Alien Technology? by JUSTONEMORELATTE · · Score: 2, Insightful

    Now how can you say that CPUs are based off of alien technology when Intel is making changes like this?

    The same way we've always been saying it -- emphatically

    --

  26. Check your facts! by Kommet · · Score: 2, Informative

    The code name Coppermine had NO relationship with the metal used inside the chip. It was still an Al-on-Si chip, just like Katmai. Tualatin (last P-III core) and Northwood (second P4 core) were the first x86 Cu-on-Si chips from Intel (targeting Mobile/Server and Mainstream markets, respectively).

    Additionally, AMD was making Cu-on-Si chips back at the Thunderbird (first "L2 cache on core" Athlon) debut. All cores that came from Fab 30 in Dresden were Cu-on-Si while all cores from Fab 25 in Autin were Al-on-Si. Palomino (first Athlon XP core) was made entirely at Fab 30 and thus all Palomino cores were Cu-on-Si.

    IBM has been producing Cu-on-Si cores since 1998 (PowerPC 740, IIRC) and producing Cu-on-SOI cores since 1999 (PowerPC 750). Where do you think AMD got their SOI technology?

  27. Re:say what? by michael_cain · · Score: 2, Informative
    Why is VLIW not more popular? Because compiler technology isn't yet good enough...
    VLIW seems to have worked out reasonably well in specialized niches -- TI's DSP chips and media processors by Equator Technologies are examples. I know that Equator has been working on their proprietary compiler technology for on the order of 15 years, so your comment about compiler technology is pretty much on target -- the people who seem to have at least some of the answers are holding them rather tightly. And of course, many of those niche applications can afford to spend time hand-tuning critical code sections.
  28. Moore's Law or self-fulfilling prophecy? by G4from128k · · Score: 2, Interesting

    Moore's Law is a market imperative, which to a business is pretty much the same thing as a law.

    Interesting insight. I wonder if there is an accidental collusion among semiconductor companies to limit their progress to Moore's observed trend? It seems suspicious to me that the trend should continue for so long without an obvious physical cause. In my orginal post, I suggested that mental and procedural limits kept companies for doubling faster than Moore's Law -- people just don't seem to create magic breakthroughs that double the transistor count in 3 months.

    But now I wonder if Moore's law is a self-fulfilling prophecy. Everyone (semiconductor makers, software creators, and chip customers) knows about the Law, so everyone obeys it. Rather than spend time doubling the transistor count in a very short time, companies stick to the industry trend and spend time on other advances (e.g., innovations in microcode, cache, bus, branch-prediction, etc.)

    The point is that in business, you need only beat your competitors by some incremental value. Thus, there is little incentive for Intel, for example, to double transistor count in 6 months as few customers would pay much more for the new breakthrough-density processor than they would for a competition-beating processor that only doubles on an 18-24 month schedule.

    Perhaps Moores Law holds because everyone obeys it -- makers are too afraid to go slower and there's little competitive advantage to going much faster.

    --
    Two wrongs don't make a right, but three lefts do.